The last COLA conference, held in a hybrid format (presentation was virtual) in Matsue, Japan, was the proper forum for the presentation entitled "UV laser microprocessing of silicon by optically-trapped dielectric microlenses" where the latest results on the project "FOCUSIS" where presented.
In the figure, a sketch of the experimental system is presented, where an optically trapped microlens is used as a second focusing lens to produce modifications on silicon. Lines are produced uniformly by the overlap of consecutive laser pulses and width is modulated by the interdistance microlens-substrate.
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